Target voltage behaviour of a vanadium-oxide thin film during reactive magnetron sputtering

王涛, 蒋亚东, 于贺, 吴志明, 赵赫男

Wang Tao(王涛), Jiang Ya-Dong(蒋亚东), Yu He(于贺), Wu Zhi-Ming(吴志明), and Zhao He-Nan(赵赫男)

中国物理B . 2011, (3): 38101 -038101 . DOI: 10.1088/1674-1056/20/3/038101