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Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition
顾广瑞, 吴宝嘉, 金 哲, Ito Toshimichi
Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition
Gu Guang-Rui(顾广瑞), Wu Bao-Jia(吴宝嘉), Jin Zhe(金哲), and Ito Toshimichi
中国物理B . 2008, (
2
): 716 -720 . DOI: 10.1088/1674-1056/17/2/059