Investigation of the a-Si:H films by using thermal and light-induced annealing treatment in atomic hydrogen atmosphere in H-W-ECR CVD system
胡跃辉, 朱秀红, 陈光华, 荣延栋, 李瀛, 宋雪梅, 周怀恩, 高卓, 马占杰, 邓金祥
Investigation of the a-Si:H films by using thermal and light-induced annealing treatment in atomic hydrogen atmosphere in H-W-ECR CVD system
Hu Yue-Hui (胡跃辉), Zhu Xiu-Hong (朱秀红), Chen Guang-Hua (陈光华), Rong Yan-Dong (荣延栋), Li Ying (李瀛), Song Xue-Mei (宋雪梅), Zhou Huai-En (周怀恩), Gao Zhuo (高卓), Ma Zhan-Jie (马占杰), Deng Jin-Xiang (邓金祥)
中国物理B
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2005, (7): 1457
-1464
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DOI: 10.1088/1009-1963/14/7/034