Upgrading design of the 3B1A beamline for x-ray nanometre lithography of microelectronic devices at BSRF
伊福廷, 叶甜春, 彭良强, 陈大鹏, 张菊芳, 韩勇
Upgrading design of the 3B1A beamline for x-ray nanometre lithography of microelectronic devices at BSRF
Yi Fu-Ting (伊福廷), Ye Tian-Chun (叶甜春), Peng Liang-Qiang (彭良强), Chen Da-Peng (陈大鹏), Zhang Ju-Fang (张菊芳), Han Yong (韩勇)
中国物理B
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2004, (5): 731
-736
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DOI: 10.1088/1009-1963/13/5/027