Monte Carlo simulation of the behaviour of electrons during electron-assisted chemical vapour deposition of diamond
董丽芳, 陈俊英, 董国义, 尚勇
Monte Carlo simulation of the behaviour of electrons during electron-assisted chemical vapour deposition of diamond
Dong Li-Fang (董丽芳), Chen Jun-Ying (陈俊英), Dong Guo-Yi (董国义), Shang Yong (尚勇)
中国物理B . 2002, (5): 419 -424 .  DOI: 10.1088/1009-1963/11/5/302