MICROSTRUCTURE OF SiO x:H FILMS PREPARED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
马智训, 廖显伯, 孔光临, 褚君浩
MICROSTRUCTURE OF SiO x:H FILMS PREPARED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
Ma Zhi-xun (马智训), Liao Xian-bo (廖显伯), Kong Guang-lin (孔光临), Chu Jun-hao (褚君浩)
中国物理B . 2000, (4): 309 -312 .  DOI: 10.1088/1009-1963/9/4/011