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DEPOSITION OF HIGH QUALITY AMORPHOUS SILICON FILMS WITH STRONG HYDROGEN DILUTED SILANE AS REACTANT GAS SOURCE
何宇亮, 刘湘娜, 殷晨钟, 张昱
DEPOSITION OF HIGH QUALITY AMORPHOUS SILICON FILMS WITH STRONG HYDROGEN DILUTED SILANE AS REACTANT GAS SOURCE
HE YU-LIANG (何宇亮), LIU XIANG-NA (刘湘娜), YIN CHENG-ZHONG (殷晨钟), ZHANG YU (张昱)
中国物理B . 1993, (
11
): 807 -815 . DOI: 10.1088/1004-423X/2/11/002