中国物理B ›› 2025, Vol. 34 ›› Issue (3): 35201-035201.doi: 10.1088/1674-1056/ada437

所属专题： Featured Column — COMPUTATIONAL PROGRAMS FOR PHYSICS

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Impurity sputtering model for ICRF edge plasma-surface interactions

Quan-Zhi Zhang(张权治)1,†,‡, Ze-Xuan Liu(刘泽璇)1,†, Fang-Fang Ma(马方方)1, Lei-Yu Zhang(张雷宇)1, and Nosir Matyakubov2,3   

  1. 1 School of Physics, Dalian University of Technology, Dalian 116024, China;
    2 Department of Physics, Urgench State University, Urgench 220100, Uzbekistan;
    3 School of Engineering, New Uzbekistan University, Tashkent 100007, Uzbekistan
  • 收稿日期:2024-10-31 修回日期:2024-12-26 接受日期:2024-12-31 发布日期:2025-03-15
  • 通讯作者: Quan-Zhi Zhang E-mail:qzzhang@dlut.edu.cn
  • 基金资助:
    This work was financially supported by the National MCF Energy R&D Program (Grant No. 2022YFE03190100), the National Natural Science Foundation of China (Grant Nos. 12422513, 12105035, and U21A20438), and the Xiaomi Young Talents Program.

Impurity sputtering model for ICRF edge plasma-surface interactions

Quan-Zhi Zhang(张权治)1,†,‡, Ze-Xuan Liu(刘泽璇)1,†, Fang-Fang Ma(马方方)1, Lei-Yu Zhang(张雷宇)1, and Nosir Matyakubov2,3   

  1. 1 School of Physics, Dalian University of Technology, Dalian 116024, China;
    2 Department of Physics, Urgench State University, Urgench 220100, Uzbekistan;
    3 School of Engineering, New Uzbekistan University, Tashkent 100007, Uzbekistan
  • Received:2024-10-31 Revised:2024-12-26 Accepted:2024-12-31 Published:2025-03-15
  • Contact: Quan-Zhi Zhang E-mail:qzzhang@dlut.edu.cn
  • Supported by:
    This work was financially supported by the National MCF Energy R&D Program (Grant No. 2022YFE03190100), the National Natural Science Foundation of China (Grant Nos. 12422513, 12105035, and U21A20438), and the Xiaomi Young Talents Program.

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摘要： One of the primary concerns associated with ion cyclotron resonance heating (ICRH) is the enhanced impurity sputtering resulting from radio frequency (RF) sheath formation near plasma-facing components (PFCs), such as limiters. Developing a sputtering model integrated with RF sheath simulations allows for a more comprehensive understanding of the kinetic behavior of incident ions and their interactions with the limiter surface. We accordingly develop an impurity sputtering model "PMSAD", which computes the sputtering yield (amount of impurity) on the limiter surface based on incident ion characteristics and predicts the spatial distribution of impurities. The model provides a robust method for understanding and analyzing the impurity sputtering process from limiter surfaces, which is crucial for preventing ICRH surface erosion and reducing edge and core plasma contamination.

关键词: ion cyclotron resonance heating (ICRH), radio frequency (RF) sheath, physical sputtering

Abstract: One of the primary concerns associated with ion cyclotron resonance heating (ICRH) is the enhanced impurity sputtering resulting from radio frequency (RF) sheath formation near plasma-facing components (PFCs), such as limiters. Developing a sputtering model integrated with RF sheath simulations allows for a more comprehensive understanding of the kinetic behavior of incident ions and their interactions with the limiter surface. We accordingly develop an impurity sputtering model "PMSAD", which computes the sputtering yield (amount of impurity) on the limiter surface based on incident ion characteristics and predicts the spatial distribution of impurities. The model provides a robust method for understanding and analyzing the impurity sputtering process from limiter surfaces, which is crucial for preventing ICRH surface erosion and reducing edge and core plasma contamination.

Key words: ion cyclotron resonance heating (ICRH), radio frequency (RF) sheath, physical sputtering

中图分类号:  (Magnetized plasmas)

  • 52.25.Xz
52.40.Fd (Plasma interactions with antennas; plasma-filled waveguides) 52.65.-y (Plasma simulation) 28.52.Av (Theory, design, and computerized simulation)