中国物理B ›› 2019, Vol. 28 ›› Issue (12): 127302-127302.doi: 10.1088/1674-1056/ab527a

• CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES • 上一篇    下一篇

Single-electron transport through single and coupling dopant atoms in silicon junctionless nanowire transistor

Xiao-Di Zhang(张晓迪), Wei-Hua Han(韩伟华), Wen Liu(刘雯), Xiao-Song Zhao(赵晓松), Yang-Yan Guo(郭仰岩), Chong Yang(杨冲), Jun-Dong Chen(陈俊东), Fu-Hua Yang(杨富华)   

  1. 1 Engineering Research Center for Semiconductor Integrated Technology&Beijing Engineering Center of Semiconductor Micro-Nano Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;
    2 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China;
    3 State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • 收稿日期:2019-09-16 修回日期:2019-10-28 出版日期:2019-12-05 发布日期:2019-12-05
  • 通讯作者: Wei-Hua Han E-mail:weihua@semi.ac.cn
  • 基金资助:
    Project supported by the National Key R&D Program of China (Grant No. 2016YFA0200503).

Single-electron transport through single and coupling dopant atoms in silicon junctionless nanowire transistor

Xiao-Di Zhang(张晓迪)1,2, Wei-Hua Han(韩伟华)1,2, Wen Liu(刘雯)1,2, Xiao-Song Zhao(赵晓松)1,2, Yang-Yan Guo(郭仰岩)1,2, Chong Yang(杨冲)1,2, Jun-Dong Chen(陈俊东)1,2, Fu-Hua Yang(杨富华)1,2,3   

  1. 1 Engineering Research Center for Semiconductor Integrated Technology&Beijing Engineering Center of Semiconductor Micro-Nano Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China;
    2 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China;
    3 State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • Received:2019-09-16 Revised:2019-10-28 Online:2019-12-05 Published:2019-12-05
  • Contact: Wei-Hua Han E-mail:weihua@semi.ac.cn
  • Supported by:
    Project supported by the National Key R&D Program of China (Grant No. 2016YFA0200503).

摘要: We investigated single-electron tunneling through single and coupling dopant-induced quantum dots (QDs) in silicon junctionless nanowire transistor (JNT) by varying temperatures and bias voltages. We observed that two possible charge states of the isolated QD confined in the axis of the initial narrowest channel are successively occupied as the temperature increases above 30 K. The resonance states of the double single-electron peaks emerge below the Hubbard band, at which several subpeaks are clearly observed respectively in the double oscillated current peaks due to the coupling of the QDs in the atomic scale channel. The electric field of bias voltage between the source and the drain could remarkably enhance the tunneling possibility of the single-electron current and the coupling strength of several dopant atoms. This finding demonstrates that silicon JNTs are the promising potential candidates to realize the single dopant atom transistors operating at room temperature.

关键词: silicon nanowire transistor, single electron tunneling, dopant-induced quantum dots, tunneling current spectroscopy

Abstract: We investigated single-electron tunneling through single and coupling dopant-induced quantum dots (QDs) in silicon junctionless nanowire transistor (JNT) by varying temperatures and bias voltages. We observed that two possible charge states of the isolated QD confined in the axis of the initial narrowest channel are successively occupied as the temperature increases above 30 K. The resonance states of the double single-electron peaks emerge below the Hubbard band, at which several subpeaks are clearly observed respectively in the double oscillated current peaks due to the coupling of the QDs in the atomic scale channel. The electric field of bias voltage between the source and the drain could remarkably enhance the tunneling possibility of the single-electron current and the coupling strength of several dopant atoms. This finding demonstrates that silicon JNTs are the promising potential candidates to realize the single dopant atom transistors operating at room temperature.

Key words: silicon nanowire transistor, single electron tunneling, dopant-induced quantum dots, tunneling current spectroscopy

中图分类号:  (Quantum dots)

  • 73.63.Kv
73.23.Hk (Coulomb blockade; single-electron tunneling) 73.43.Jn (Tunneling) 85.35.Gv (Single electron devices)