Fabrication processing effects on microstructure and morphology of erbium film

doi:10.1088/1674-1056/21/7/076101

中国物理B ›› 2012, Vol. 21 ›› Issue (7): 76101-076101.doi: 10.1088/1674-1056/21/7/076101

• CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES • 上一篇下一篇

Fabrication processing effects on microstructure and morphology of erbium film

申华海^a, 彭述明^b, 龙兴贵^b, 周晓松^b, 杨莉^a, 刘锦华^b, 孙庆强^a, 祖小涛^a

a Department of Applied Physics, University of Electronic Science and Technology of China, Chengdu 610054, China;
b Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China

收稿日期:2011-09-29 修回日期:2012-02-26 出版日期:2012-06-01 发布日期:2012-06-01
基金资助:
Project supported by the National Natural Science Foundation of China (Grant No. 10976007), the Fundamental Research Funds for the Central Universities, China (Grant No. ZYGX2009J040), the Science and Technology Foundation of CAEP, China (Grant No. 2009A0301015), and the Major Program of the National Natural Science Foundation of China (Grant No. 91126001).

Fabrication processing effects on microstructure and morphology of erbium film

Shen Hua-Hai(申华海)^a), Peng Shu-Ming(彭述明)^b), Long Xing-Gui(龙兴贵)^b), Zhou Xiao-Song(周晓松)^b), Yang Li(杨莉)^a), Liu Jin-Hua(刘锦华)^b), Sun Qing-Qiang(孙庆强)^a), and Zu Xiao-Tao(祖小涛)^a)^†

a Department of Applied Physics, University of Electronic Science and Technology of China, Chengdu 610054, China;
b Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China

Received:2011-09-29 Revised:2012-02-26 Online:2012-06-01 Published:2012-06-01
Contact: Zu Xiao-Tao E-mail:xtzu@uestc.edu.cn
Supported by:
Project supported by the National Natural Science Foundation of China (Grant No. 10976007), the Fundamental Research Funds for the Central Universities, China (Grant No. ZYGX2009J040), the Science and Technology Foundation of CAEP, China (Grant No. 2009A0301015), and the Major Program of the National Natural Science Foundation of China (Grant No. 91126001).

摘要/Abstract

摘要： The effects of substrate temperature on the microstructure and the morphology of erbium film are systematically investigated by using X-ray diffraction (XRD) and scanning electron microscopy (SEM). All the erbium films are grown by the electron-beam vapor deposition (EBVD). A novel preparation method for observing the cross-section morphology of the erbium film is developed. The films deposited at 200 ℃ have (002) preferred orientation, and the films deposited at 450 ℃ have mixed (100) and (101) texture, which are due to the different growth mechanisms of surface energy minimization and recrystallization, respectively. The peak positions and the full widths at half maximum (FWHMs) of erbium diffraction lines (100), (002), and (101) shift towards higher angles and decrease with the increasing substrate temperature in a largely uniform manner, respectively. Also, the lattice constants decrease with the increasing temperature. The transition in the film stresses can be used to interpret the changes in peak positions, FWHMs, and lattice constants. The stress is compressive for the as-growth films, and is counteracted by the tensile stress formed during the process of temperature cooling down to room temperature. The tensile stress mainly originates from the difference in the coefficients of thermal expansion of substrate--film couple.

关键词: erbium film, substrate temperature, preferred orientation, columnar grain

Abstract: The effects of substrate temperature on the microstructure and the morphology of erbium film are systematically investigated by using X-ray diffraction (XRD) and scanning electron microscopy (SEM). All the erbium films are grown by the electron-beam vapor deposition (EBVD). A novel preparation method for observing the cross-section morphology of the erbium film is developed. The films deposited at 200 ℃ have (002) preferred orientation, and the films deposited at 450 ℃ have mixed (100) and (101) texture, which are due to the different growth mechanisms of surface energy minimization and recrystallization, respectively. The peak positions and the full widths at half maximum (FWHMs) of erbium diffraction lines (100), (002), and (101) shift towards higher angles and decrease with the increasing substrate temperature in a largely uniform manner, respectively. Also, the lattice constants decrease with the increasing temperature. The transition in the film stresses can be used to interpret the changes in peak positions, FWHMs, and lattice constants. The stress is compressive for the as-growth films, and is counteracted by the tensile stress formed during the process of temperature cooling down to room temperature. The tensile stress mainly originates from the difference in the coefficients of thermal expansion of substrate--film couple.

Key words: erbium film, substrate temperature, preferred orientation, columnar grain

中图分类号: (Techniques for structure determination)

61.05.-a

81.10.Jt (Growth from solid phases (including multiphase diffusion and recrystallization)) 81.10.-h (Methods of crystal growth; physics and chemistry of crystal growth, crystal morphology, and orientation) 81.15.Jj (Ion and electron beam-assisted deposition; ion plating)

申华海, 彭述明, 龙兴贵, 周晓松, 杨莉, 刘锦华, 孙庆强, 祖小涛 . Fabrication processing effects on microstructure and morphology of erbium film[J]. 中国物理B, 2012, 21(7): 76101-076101.

Shen Hua-Hai(申华海), Peng Shu-Ming(彭述明), Long Xing-Gui(龙兴贵), Zhou Xiao-Song(周晓松), Yang Li(杨莉), Liu Jin-Hua(刘锦华), Sun Qing-Qiang(孙庆强), and Zu Xiao-Tao(祖小涛) . Fabrication processing effects on microstructure and morphology of erbium film[J]. Chin. Phys. B, 2012, 21(7): 76101-076101.

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Fabrication processing effects on microstructure and morphology of erbium film

Fabrication processing effects on microstructure and morphology of erbium film

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