中国物理B ›› 2012, Vol. 21 ›› Issue (3): 33301-033301.doi: 10.1088/1674-1056/21/3/033301

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张文涛1,朱保华1,黄静2,熊显名1,蒋曲博1   

  • 收稿日期:2011-06-21 修回日期:2011-10-11 出版日期:2012-02-15 发布日期:2012-02-15
  • 通讯作者: 张文涛,glietzwt@163.com E-mail:glietzwt@163.com

The influence of divergence angle on the deposition of neutral chromium atoms using a laser standing wave

Zhang Wen-Tao(张文涛)a)†, Zhu Bao-Hua(朱保华)a), Huang Jing(黄静)b), Xiong Xian-Ming(熊显名)a), and Jiang Qu-Bo(蒋曲博)a)   

  1. a. Guilin University of Electronic Technology, Guilin 541004, China;
    b. Guizhou University for Nationalities, Guiyang 550000, China
  • Received:2011-06-21 Revised:2011-10-11 Online:2012-02-15 Published:2012-02-15
  • Contact: Zhang Wen-Tao,glietzwt@163.com E-mail:glietzwt@163.com
  • Supported by:
    Project supported by the National Natural Science Foundation of China (Grant Nos. 11064002 and 11061011).

Abstract: The characteristics of neutral chromium atoms in the standing wave field are discussed. Based on a semi-classical model, the motion equation of neutral atoms in the laser standing wave field is analyzed, and the trajectories of the atoms are obtained by simulations with the different divergence angles of the atomic beam. The simulation results show that the full width at half maximum (FWHM) of the stripe is 2.75 nm and the contrast is 38.5:1 when the divergence angle equals 0 mrad, the FWHM is 24.1 nm and the contrast is 6.8:1 when the divergence angle equals 0.2 mrad and the FWHMs are 58.6 and 137.8 nm, and the contrasts are 3.3:1 and 1.6:1 when the divergence angles equal 0.5 and 1.0 mrad, respectively.

Key words: atom lithography, laser standing wave, full wave at half maximum, contrast

中图分类号:  (Photon interactions with molecules)

  • 33.80.-b
42.50.Wk (Mechanical effects of light on material media, microstructures and particles)