中国物理B ›› 2001, Vol. 10 ›› Issue (13): 45-49.

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SCANNING AUGER ELECTRON SPECTROSCOPIC INVESTIGATIONS OF MAGNETOSTRICTIVE NANOSCALE MULTILAYERS

Eberhard Nold2, Christel Adelhelm2, Alfred Ludwig1, 沈电洪3   

  1. (1)Center of Advanced European Studies and Research, Friedensplatz 16, D-53111 Bonn, FRG; (2)Forschungszentrum Karlsruhe GmbH,Institut für Materialforschung, 1, Postfach, 3640, D-76021 Karlsruhe, FRG; (3)Institute of Physics, Chinese Academy of Sciences, Beiing 100080, China
  • 收稿日期:2001-03-05 出版日期:2001-12-25 发布日期:2005-07-07

SCANNING AUGER ELECTRON SPECTROSCOPIC INVESTIGATIONS OF MAGNETOSTRICTIVE NANOSCALE MULTILAYERS

Eberhard Nolda, Christel Adelhelma, Alfred Ludwigb, Shen Dian-hong (沈电洪)c   

  1. a Forschungszentrum Karlsruhe GmbH,Institut für Materialforschung, 1, Postfach, 3640, D-76021 Karlsruhe, FRG; b Center of Advanced European Studies and Research, Friedensplatz 16, D-53111 Bonn, FRG; c Institute of Physics, Chinese Academy of Sciences, Beiing 100080, China
  • Received:2001-03-05 Online:2001-12-25 Published:2005-07-07

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摘要： The characterisation of thin magnetostrictive multilayers in the nanometerscale range [(4,5nmTb40Fe60/9nmFe)×100] demands a surface sensitive analytical technique. A suitable technique is scanning Auger Electron Spectroscopy (AES) to determine the elemental composition, the thickness, the presence of interdiffusion between thin layers, or the presence of contamination at interfaces.Auger sputter depth profiles are obtained by using Xe-Ion bombardment to etch the sample.Sample rotation during sputtering produces shallow craters, minimises roughening and enhances depth resolution. In addition, Auger maps of the craters are used to reveal the separated magnetostrictive Tb40Fe60 layers and soft magnetic Fe layers.

Abstract: The characterisation of thin magnetostrictive multilayers in the nanometerscale range [(4,5nmTb40Fe60/9nmFe)×100] demands a surface sensitive analytical technique. A suitable technique is scanning Auger Electron Spectroscopy (AES) to determine the elemental composition, the thickness, the presence of interdiffusion between thin layers, or the presence of contamination at interfaces.Auger sputter depth profiles are obtained by using Xe-Ion bombardment to etch the sample.Sample rotation during sputtering produces shallow craters, minimises roughening and enhances depth resolution. In addition, Auger maps of the craters are used to reveal the separated magnetostrictive Tb40Fe60 layers and soft magnetic Fe layers.

Key words: Auger electron spectroscopy , sputter depth profiles, magnetostrictive multilayer films

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  • 8280