中国物理B ›› 1995, Vol. 4 ›› Issue (11): 834-841.doi: 10.1088/1004-423X/4/11/006

• • 上一篇    下一篇

BAND STRUCTURES OF Si-C AND Si-C-Ge ALLOYS

谢建军, 张开明   

  1. Department of Physics, Fudan University, Shanghai 200433, China
  • 收稿日期:1994-11-24 出版日期:1995-11-20 发布日期:1995-11-20
  • 基金资助:
    project supported by the National Natural Science Foundation of China.

BAND STRUCTURES OF Si-C AND Si-C-Ge ALLOYS

XIE JIAN-JUN (谢建军), ZHANG KAI-MING (张开明)   

  1. Department of Physics, Fudan University, Shanghai 200433, China
  • Received:1994-11-24 Online:1995-11-20 Published:1995-11-20
  • Supported by:
    project supported by the National Natural Science Foundation of China.

摘要: Band structures of Si-C and Si-C-Ge alloys are calculated by using the ab initio LMTO (linear muffin-tin orbital) method within the framework of atomic-sphere approximation. The effects of different atomic configuration and lattice relaxation on the band structure of alloys are taken into account. The results show that for large concentrations of C in Si and Si-Ge, the band gap increases monotonically, while for small concentrations of C in Si and Si-Ge, the band gap shrinks. The lattice relaxation further reduces the band gap. The possible explanations for the reduction of band gap of Si-C and Si-C-Ge alloya are presented.

Abstract: Band structures of Si-C and Si-C-Ge alloys are calculated by using the ab initio LMTO (linear muffin-tin orbital) method within the framework of atomic-sphere approximation. The effects of different atomic configuration and lattice relaxation on the band structure of alloys are taken into account. The results show that for large concentrations of C in Si and Si-Ge, the band gap increases monotonically, while for small concentrations of C in Si and Si-Ge, the band gap shrinks. The lattice relaxation further reduces the band gap. The possible explanations for the reduction of band gap of Si-C and Si-C-Ge alloya are presented.

中图分类号:  (Semiconductor compounds)

  • 71.20.Nr
71.15.Ap (Basis sets (LCAO, plane-wave, APW, etc.) and related methodology (scattering methods, ASA, linearized methods, etc.))