中国物理B ›› 1993, Vol. 2 ›› Issue (12): 907-916.doi: 10.1088/1004-423X/2/12/004

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THE PRODUCTION AND CHARACTERISTICS OF THE SLOSHING ELECTRONS IN A MAGNETIC MIRROR

 方瑜德1, 任兆杏1, 邱励俭1, 张建德2   

  1. (1)Institute of Plasma Physics, Academia Sinica, Hefei 230031, China; (2)National University of Defense Technology, Changsha 410073, China
  • 收稿日期:1993-01-05 出版日期:1993-12-20 发布日期:1993-12-20
  • 基金资助:
    Project supported by the National Natural Science Foundation of China.

THE PRODUCTION AND CHARACTERISTICS OF THE SLOSHING ELECTRONS IN A MAGNETIC MIRROR

ZHANG JIAN-DE (张建德)a, FANG YU-DE (方瑜德)b, REN ZHAO-XING (任兆杏)b, QIU LI-JIAN (邱励俭)b   

  1. a National University of Defense Technology, Changsha 410073, China; b Institute of Plasma Physics, Academia Sinica, Hefei 230031, China
  • Received:1993-01-05 Online:1993-12-20 Published:1993-12-20
  • Supported by:
    Project supported by the National Natural Science Foundation of China.

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摘要： The experiment on the formation of sloshing electrons by electron cyclotron resonance heating in a magnetic mirror is described, and the physical properties of them are investigated. The results show that (1) the sloshing electron configuration is formed, and its characteristics are very different from those of the hot electron ring; (2) Rn, the hot electron density ratio which represents the sloshing electron configuration, decreases as the mirror magnetic field increases, and the maximum of Rn can reach about 2.65.

Abstract: The experiment on the formation of sloshing electrons by electron cyclotron resonance heating in a magnetic mirror is described, and the physical properties of them are investigated. The results show that (1) the sloshing electron configuration is formed, and its characteristics are very different from those of the hot electron ring; (2) Rn, the hot electron density ratio which represents the sloshing electron configuration, decreases as the mirror magnetic field increases, and the maximum of Rn can reach about 2.65.

中图分类号:  (Magnetic mirrors, gas dynamic traps)

  • 52.55.Jd
52.50.Sw (Plasma heating by microwaves; ECR, LH, collisional heating) 28.52.-s (Fusion reactors)