An analytical model for nanowire junctionless SOI FinFETs with considering three-dimensional coupling effect
Liu Fan-Yu1, †, , Liu Heng-Zhu1, Liu Bi-Wei1, Guo Yu-Feng2
       

Potential profiles in partially-depleted region along x = 0 (see Fig. 1) for variable front gate voltage. (a) Wfin = 100 nm and (b) Wfin = 9 nm. ND = 1019 cm−3, Tsi = 9 nm, VD = 0.05 V, and VBG = 0 V.