Normally-off metamorphic AlInAs/AlInAs HEMTs on Si substrates grown by MOCVD
Huang Jie†a), Li Ming‡b), Lau Kei-Mayc)
       
(a), (b) Dependence of AlInAs/GaInAs mHEMT V th on CF4 plasma power. (c) Reverse- and forward-baised gate current of AlInAs/GaInAs mHEMTs with different CF4 plasma treatments.