Modulation of WN x/Ge Schottky barrier height by varying N composition of tungsten nitride*
Wei Jiang-Bina), Chi Xiao-Weia), Lu Chaoa), Wang Chena), Lin Guang-Yanga), Wu Huan-Daa), Huang Wei†a), Li Cheng‡a), Chen Song-Yana), Liu Chun-Lib)
       
J – V characteristics of the WN x /Ge films formed with different Ar/N2 flow rate ratios. (a) WN x /p-Ge (b) WN x /n-Ge.