Enhanced surface plasmon interference lithography from cavity resonance in the grating slits*
Guo Kai, Liu Jian-Long, Zhou Ke-Ya, Liu Shu-Tian†
       
Maximum of the interference peak and the uniformity along the cut line (shown in Fig. 1 ) versus (a) the slit width w and (b) the grating thickness L . The unit a.u. means arbitrary units.