Effect of twin boundary on nanoimprint process of bicrystal Al thin film studied by molecular dynamics simulation<xref ref-type="fn" rid="cpb141212fn1">*</xref>

Effect of twin boundary on nanoimprint process of bicrystal Al thin film studied by molecular dynamics simulation*

Xie Yue-Hong^a)†, Xu Jian-Gang^a), Song Hai-Yang^b)‡, Zhang Yun-Guang^a)

Instantaneous defect structures of bicrystal Al thin film and single crystal with different mould displacements when the TB direction is parallel to the imprinting direction at 0.01 K obtained by our MD simulation. Five kinds of mark intervals are used: (a) 10.1 nm, (b) 11.7 nm, (c) 13.7 nm, (d) 15.7 nm, (e) 17.7 nm; (f) single crystal.