Effect of twin boundary on nanoimprint process of bicrystal Al thin film studied by molecular dynamics simulation*
Xie Yue-Honga)†, Xu Jian-Ganga), Song Hai-Yangb)‡, Zhang Yun-Guanga)
       
The imprinting force varies with the mould displacement on single crystal and bicrystal Al thin film using five kinds of mark intervals when the TB direction is parallel to the imprinting direction at 0.01 K. Model 6 uses a single crystal. For models 1–5, the mark intervals are 10.1 nm, 11.7 nm, 13.7 nm, 15.7 nm, and 17.7 nm, respectively.