Mechanical strains in pecvd SiN x:H films for nanophotonic application
Semenova O.†a) 
, Kozelskaya A.b) , Zhi-Yong Lic) , Yu-De Yuc)
, Kozelskaya A.
Mechanical strains in pecvd SiN x:H films for nanophotonic application |
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Semenova O.†
, Kozelskaya A. |
| (a) Variations of refractive index n and (b) N–H and Si–H bond concentrations with power density of HF discharge for the films deposited at 160 °C. |
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