TY - Chin. Phys. B A1 - Ma Zhi-xun (马智训), Liao Xian-bo (廖显伯), Kong Guang-lin (孔光临), Chu Jun-hao (褚君浩) T1 - MICROSTRUCTURE OF SiOx:H FILMS PREPARED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION Y1 - 2000-04-15 JF - Chinese Physics B JO - Chin. Phys. B SP - 309 EP - 312 VL - 9 IS - 4 UR - https://cpb.iphy.ac.cn N1 - 10.1088/1009-1963/9/4/011 ER -