%A Jia-Jun Ma(马佳俊), Kang Wu(吴康), Zhen-Yu Wang(王振宇), Rui-Song Ma(马瑞松), Li-Hong Bao(鲍丽宏), Qing Dai(戴庆), Jin-Dong Ren(任金东), and Hong-Jun Gao(高鸿钧) %T Monolayer MoS2 of high mobility grown on SiO2 substrate by two-step chemical vapor deposition %0 Journal Article %D 2022 %J Chin. Phys. B %R 10.1088/1674-1056/ac6737 %P 88105-088105 %V 31 %N 8 %U {https://cpb.iphy.ac.cn/CN/abstract/article_124971.shtml} %8 2022-07-18 %X We report a novel two-step ambient pressure chemical vapor deposition (CVD) pathway to grow high-quality MoS2 monolayer on the SiO2 substrate with large crystal size up to 110 μm. The large specific surface area of the pre-synthesized MoO3 flakes on the mica substrate compared to MoO3 powder could dramatically reduce the consumption of the Mo source. The electronic information inferred from the four-probe scanning tunneling microscope (4P-STM) image explains the threshold voltage variations and the n-type behavior observed in the two-terminal transport measurements. Furthermore, the direct van der Pauw transport also confirms its relatively high carrier mobility. Our study provides a reliable method to synthesize high-quality MoS2 monolayer, which is confirmed by the direct 4P-STM measurement results. Such methodology is a key step toward the large-scale growth of transition metal dichalcogenides (TMDs) on the SiO2 substrate and is essential to further development of the TMDs-related integrated devices.