@article{Li-Fan Wu(武利翻):108101,
author = {Li-Fan Wu(武利翻) and Yu-Ming Zhang(张玉明) and Hong-Liang Lv(吕红亮) and Yi-Men Zhang(张义门)},
title = {Atomic-layer-deposited Al2O3 and HfO2 on InAlAs: A comparative study of interfacial and electrical characteristics},
publisher = {Chin. Phys. B},
year = {2016},
journal = {Chinese Physics B},
volume = {25},
number = {10},
eid = {108101},
pages = {108101},
keywords = {high-k dielectric;atomic layer deposition;InAlAs;characteristics},
url = {https://cpb.iphy.ac.cn/EN/abstract/article_119043.shtml},
doi = {10.1088/1674-1056/25/10/108101}
}