@article{Luo Bing-Chi (罗炳池):66804, author = {Luo Bing-Chi (罗炳池) and Li Kai (李恺) and Kang Xiao-Li (康晓丽) and Zhang Ji-Qiang (张吉强) and He Yu-Dan (何玉丹) and Luo Jiang-Shan (罗江山) and Wu Wei-Dong (吴卫东) and Tang Yong-Jian (唐永建)}, title = {Sputtering pressure influence on growth morphology, surface roughness, and electrical resistivity for strong anisotropy beryllium film}, publisher = {Chin. Phys. B}, year = {2014}, journal = {Chinese Physics B}, volume = {23}, number = {6}, eid = {066804}, pages = {066804}, keywords = {magnetron sputtering;growth morphology;Be films;electrical resistivity}, url = {https://cpb.iphy.ac.cn/EN/abstract/article_116312.shtml}, doi = {10.1088/1674-1056/23/6/066804} }