@article{Liu Xiang-Mei (刘相梅):45204,
author = {Liu Xiang-Mei (刘相梅) and Song Yuan-Hong (宋远红) and Jiang Wei (姜巍) and Yi Lin (易林)},
title = {The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH4/NH3/N2 plasmas: Two-dimensional simulations},
publisher = {Chin. Phys. B},
year = {2013},
journal = {Chinese Physics B},
volume = {22},
number = {4},
eid = {045204},
pages = {045204},
keywords = {capacitively coupled plasma;process conditions effects;SiH#sub#4#/sub#/NH#sub#3#/sub#/N#sub#2#/sub# discharges},
url = {https://cpb.iphy.ac.cn/EN/abstract/article_114738.shtml},
doi = {10.1088/1674-1056/22/4/045204}
}