Optimization of laser focused atomic deposition by channeling

doi:10.1088/1674-1056/ab631c

Abstract Laser focused atomic deposition is a unique and effective way to fabricate highly accurate pitch standards in nanometrology. However, the stability and repeatability of the atom lithography fabrication process remains a challenging problem for massive production. Based on the atom-light interaction theory, channeling is utilized to improve the stability and repeatability. From the comparison of three kinds of atom-light interaction models, the optimal parameters for channeling are obtained based on simulation. According to the experimental observations, the peak to valley height of Cr nano-gratings keeps stable when the cutting proportion changes from 15% to 50%, which means that the channeling shows up under this condition. The channeling proves to be an effective method to optimize the stability and repeatability of laser focused Cr atomic deposition.

Keywords: laser focused atomic deposition nano-grating length transition standards channeling

Received: 20 September 2019
Revised: 10 December 2019
Accepted manuscript online:

PACS:	06.20.fb	(Standards and calibration)
	42.50.Wk	(Mechanical effects of light on material media, microstructures and particles)
	81.16.Nd	(Micro- and nanolithography)

Fund: Project supported by the National Key Research and Development Program of China (Grant No. 2016YFA0200902), Science and Technology Commission of Shanghai Municipality, China (Grant No. 17JC1400801), and Young Scientists Fund of the National Natural Science Foundation of China (Grant No. 51705369).

Corresponding Authors: Xiao Deng
E-mail: 1110490dengxiao@tongji.edu.cn

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Jie Chen(陈杰), Jie Liu(刘杰), Li Zhu(朱立), Xiao Deng(邓晓), Xinbin Cheng(陈鑫彬), Tongbao Li(李同保) Optimization of laser focused atomic deposition by channeling 2020 Chin. Phys. B 29 020601

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