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Chin. Phys. B, 2017, Vol. 26(11): 118104    DOI: 10.1088/1674-1056/26/11/118104
INTERDISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY Prev   Next  

Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching

Yuan Li(李源)1,2, Hongwei Yan(严鸿维)2, Ke Yang(杨科)2, Caizhen Yao(姚彩珍)2, Zhiqiang Wang(王志强)2, Chunyan Yan(闫春燕)1, Xinshu Zou(邹鑫书)2, Xiaodong Yuan(袁晓东)2, Liming Yang(杨李茗)3, Xin Ju(巨新)1
1. University of Science and Technology Beijing, Department of Physics, Beijing 100083, China;
2. China Academy of Engineering Physics, Laser Fusion Research Center, Mianyang 621900, China;
3. Fine Optical Engineering Research Center, Chengdu 610041, China
Abstract  

Polished fused silica samples were etched for different durations by using hydrofluoric (HF) acid solution with HF concentrations in an ultrasonic field. Surface and subsurface polishing residues and molecular structure parameters before and after the etching process were characterized by using a fluorescence microscope and infrared (IR) spectrometer, respectively. The laser induced damage thresholds (LIDTs) of the samples were measured by using pulsed nanosecond laser with wavelength of 355 nm. The results showed that surface and subsurface polishing residues can be effectively reduced by the acid etching process, and the LIDTs of fused silica are significantly improved. The etching effects increased with the increase of the HF concentration from 5 wt.% to 40 wt.%. The amount of polishing residues decreased with the increase of the etching duration and then kept stable. Simultaneously, with the increase of the etching time, the mechanical strength and molecular structure were improved.

Keywords:  HF etching      fused silica      laser induced damage threshold      infrared spectra  
Received:  13 May 2017      Revised:  21 July 2017      Accepted manuscript online: 
PACS:  81.65.Cf (Surface cleaning, etching, patterning)  
  33.20.Ea (Infrared spectra)  
  42.70.Ce (Glasses, quartz)  
Fund: 

Project supported by the China Postdoctoral Science Foundation (Grant No. 2016M592709) and the National Natural Science Foundation of China (Grant No. 51535003).

Corresponding Authors:  Xin Ju     E-mail:  jux@ustb.edu.cn

Cite this article: 

Yuan Li(李源), Hongwei Yan(严鸿维), Ke Yang(杨科), Caizhen Yao(姚彩珍), Zhiqiang Wang(王志强), Chunyan Yan(闫春燕), Xinshu Zou(邹鑫书), Xiaodong Yuan(袁晓东), Liming Yang(杨李茗), Xin Ju(巨新) Improvement of laser damage thresholds of fused silica by ultrasonic-assisted hydrofluoric acid etching 2017 Chin. Phys. B 26 118104

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