Chin. Phys. B
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Chin. Phys. B  2017, Vol. 26 Issue (1): 015201    DOI: 10.1088/1674-1056/26/1/015201
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Current Issue| Next Issue| Archive| Adv Search |
Fluid simulation of the pulsed bias effect on inductively coupled nitrogen discharges for low-voltage plasma immersion ion implantation
Xiao-Yan Sun(孙晓艳), Yu-Ru Zhang(张钰如), Xue-Chun Li(李雪春), You-Nian Wang(王友年)
Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams(Ministry of Education), School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

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