Chin. Phys. B
Citation Search Quick Search
Chin. Phys. B  2015, Vol. 24 Issue (12): 125201    DOI: 10.1088/1674-1056/24/12/125201
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Current Issue| Next Issue| Archive| Adv Search |
Study of hysteresis behavior in reactive sputtering of cylindrical magnetron plasma
H. Kakatia, S. M. Borahb
a Jorhat Institute of Science and Technology, Jorhat 10, Assam, India;
b Department of Applied Sciences, Gauhati University, Jalukbari, Guwahati-781014, Assam, India

Copyright © the Chinese Physical Society
Address: Institute of Physics, Chinese Academy of Sciences, P. O. Box 603,Beijing 100190 China(100190)
Tel: 010-82649026   Fax: 010-82649027   E-Mail: cpb@aphy.iphy.ac.cn
Supported by Beijing Magtech Co. Ltd. Tel: 86-010-62662699 E-mail: support@magtech.com.cn