Chin. Phys. B
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Chin. Phys. B  2015, Vol. 24 Issue (9): 095203    DOI: 10.1088/1674-1056/24/9/095203
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Current Issue| Next Issue| Archive| Adv Search |
Fluid simulation of inductively coupled Ar/O2 plasmas: Comparisons with experiment
Wang Yan-Hui, Liu Wei, Zhang Yu-Ru, Wang You-Nian
Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

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