Current-voltage characteristics of hydrogen DC plasma torches with different sizes in an external axial magnetic field

doi:10.1088/1674-1056/24/6/065205

Abstract Current–voltage (I–V) characteristics of hydrogen DC plasma torches with different sizes in an external axial magnetic field under atmospheric pressure are reported. Three anodes with different diameters are adopted in a 50-kW torch: 25 mm, 30 mm, and 35 mm, respectively. Two different diameters of anodes, that is, 100 mm and 130 mm, are adopted in a 1-MW plasma torch. The arc voltage shows a negative trend with the increase of arc current under the operating regimes. On the contrary, arc voltage shows a positive trend as the flow rate of carrier gas increases, and a similar trend is found with increasing the external magnetic flux density. A similarity formula is constructed to correlate the experimental data of the torches mentioned above. Linear fitting shows that the Pearson correlation coefficient is 0.9958.

Keywords: magnetically rotating hydrogen plasma I–V characteristics similarity theory

Received: 19 November 2014
Revised: 30 December 2014
Accepted manuscript online:

PACS:

52.80.-s

(Electric discharges)

Fund: Project supported by the Special Fund for Basic Scientific Research of Central Colleges, China (Grant No. 2012FZA4023).

Corresponding Authors: Su Bao-Gen
E-mail: subg@zju.edu.cn

About author: 52.80.-s

Cite this article:

Ma Jie (马杰), Wen Guang-Dong (闻光东), Su Bao-Gen (苏宝根), Yang Yi-Wen (杨亦文), Ren Qi-Long (任其龙) Current-voltage characteristics of hydrogen DC plasma torches with different sizes in an external axial magnetic field 2015 Chin. Phys. B 24 065205

[1]	Pfender E 1999 Plasma Chem. Plasma P. 19 1
[2]	Bian H, Yang Y, Wang Y and Tian W 2012 Powder Technol. 219 257
[3]	Colombo V, Concetti A, Ghedini E, Rotundo F, Sanibondi P, Boselli M, Dallavalle S, Gherardi M, Nemchinsky V and Vancini M 2012 Plasma Chem. Plasma P. 32 411
[4]	Chaudhary K T, Ali J and Yupapin P P 2014 Chin. Phys. B 23 035203
[5]	Ahmad R, Hussain T, Khan I A and Rawat R S 2014 Chin. Phys. B 23 065204
[6]	Bao W R, Chang L P and Lu Y K 2006 Process. Saf. Environ. 84 222
[7]	Wu C, Chen J and Cheng Y 2010 Fuel Process. Technol. 91 823
[8]	Xia W, Li L, Zhao Y, Ma Q, Du B, Chen Q and Cheng L 2006 Appl. Phys. Lett. 88 211501
[9]	Vursel F and Polak L 1971 Reactions under Plasma Conditions, ed. Venugopalan M (New York: Wiley Interscince)
[10]	Fincke J R, Anderson R P, Hyde T, Detering B A, Wright R, Bewley R L, Haggard D C and Swank W D 2002 Plasma Chem. Plasma P. 22 105
[11]	Zhao P, Ni G H, Meng Y D and Nagatsu M 2013 Chin. Phys. B 22 064701
[12]	Shashkov A G and Yas'Ko O I 1973 IEEE Trans. Plasma Sci. 1 21
[13]	Yas Ko O I 1990 Pure Appl. Chem. 62 1817
[14]	Brilhac J F, Pateyron B, Delluc G, Coudert J F and Fauchais P 1995 Plasma Chem. Plasma P. 15 231
[15]	Brilhac J F, Pateyron B, Coudert J F, Fauchais P and Bouvier A 1995 Plasma Chem. Plasma P. 15 257
[16]	Zhang H, Wu G, Li H and Bao C 2009 IEEE Trans. Plasma Sci. 37 1129
[17]	Paingankar A M, Das A K, Shirodkar V S, Sreekumar K P and Venkatramani N 1999 Plasma Sources Sci. Technol. 8 100
[18]	Pan W X, Meng X and Wu C 2006 Plasma Sci. Technol. 8 416
[19]	Bora B, Aomoa N and Kakati M 2010 Plasma Sci. Technol. 12 181
[20]	Barreto P, Del Bosco E and Simpson S W 1999 J. Phys. D: Appl. Phys. 32 2630
[21]	Bao S C, Guo W K, Ye M Y, Xu P and Zhang X D 2008 Plasma Sci. Technol. 10 701
[22]	Valinčius V, Krušinskaite V, Valatkevičius P, Valinčiūte V and Marcinauskas L 2004 Plasma Sources Sci. Technol. 13 199

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Current-voltage characteristics of hydrogen DC plasma torches with different sizes in an external axial magnetic field

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