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Ordered silicon nanorod arrays with controllable geometry and robust hydrophobicity |
| Wang Zi-Wen (王子文), Cai Jia-Qi (蔡家琦), Wu Yi-Zhi (吴以治), Wang Hui-Jie (王会杰), Xu Xiao-Liang (许小亮) |
| Department of Physics, University of Science and Technology of China, Hefei 230026, China |
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Abstract Highly ordered silicon nanorod (SiNR) arrays with controllable geometry are fabricated via nanosphere lithography and metal-assisted chemical etching. It is demonstrated that the key to achieving a high-quality metal mask is to construct a non-close-packed template that can be removed with negligible damage to the mask. Hydrophobicity of SiNR arrays of different geometries is also studied. It is shown that the nanorod structures are effectively quasi-hydrophobic with a contact angle as high as 142°, which would be useful in self-cleaning nanorod-based device applications.
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Received: 28 June 2014
Revised: 04 August 2014
Accepted manuscript online:
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PACS:
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78.67.Qa
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(Nanorods)
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68.08.Bc
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(Wetting)
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| Fund: Project supported by the National Natural Science Foundation of China (Grant No. 51272246) and the Scientific and Technological Research Foundation of Anhui Province, China (Grant No. 12010202035). |
Corresponding Authors:
Xu Xiao-Liang
E-mail: xlxu@ustc.edu.cn
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Cite this article:
Wang Zi-Wen (王子文), Cai Jia-Qi (蔡家琦), Wu Yi-Zhi (吴以治), Wang Hui-Jie (王会杰), Xu Xiao-Liang (许小亮) Ordered silicon nanorod arrays with controllable geometry and robust hydrophobicity 2015 Chin. Phys. B 24 017802
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