| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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Three-dimensional PIC/MCC simulation of electron deposition in JAEA 10 A ion sources |
| Yang Chao (杨超), Yin Mao-Wei (印茂伟), Shang Li-Ping (尚丽平), Wei Ai-Yong (韦爱勇) |
| School of National Defense Science and Technology, Southwest University of Science and Technology, Mianyang 621010, China |
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Abstract A systematic research on the electron deposition process in the JAEA 10 A ion source is carried out by using a particle-in-cell/Monte Carlo collision simulation, which is based on a full three-dimensional self-developed code. Two parts are studied. One is the space and energy distribution of fast and slow electrons, the other is the vibration excitation collisions between electrons and hydrogen moleculars. The results show that the inhomogeneity of electrons comes from the Y direction drift of the fast electrons (Te ≥qq25 eV) due to the action of the magnetic fields. This drift also increases the number of vibration excitation collisions in the -Y direction, and results in the increase of Ha in the -Y direction, eventually leading to the -Y drift of H-. It explains the spatial non-uniformity in the JAEA 10 A ion source.
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Received: 17 December 2013
Revised: 12 February 2014
Accepted manuscript online:
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PACS:
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52.65.Pp
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(Monte Carlo methods)
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52.50.Dg
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(Plasma sources)
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29.20.Ej
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(Linear accelerators)
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| Fund: Project supported by the National Natural Science Foundation of China (Grant No. 11176032), the China Academy of Engineering Physics (CAEP) THz Science and Technology Foundation (Grant No. CAEPTHZ201209), the Scientific Reserch Fund of Sichuan Provincial Education Department, China (Grant No. 12ZA183), and the Southwest University of Science and Technology Doctor Fund, China (Grant No. 13zx7106). |
Corresponding Authors:
Yang Chao
E-mail: ychao1983@126.com
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Cite this article:
Yang Chao (杨超), Yin Mao-Wei (印茂伟), Shang Li-Ping (尚丽平), Wei Ai-Yong (韦爱勇) Three-dimensional PIC/MCC simulation of electron deposition in JAEA 10 A ion sources 2014 Chin. Phys. B 23 095201
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