Annealing effect of platinum-incorporated nanowires created by focused ion/electron-beam-induced deposition

doi:10.1088/1674-1056/23/8/088111

Abstract Focused ion-beam-induced deposition (FIBID) and focused electron-beam-induced deposition (FEBID) are convenient and useful in nanodevice fabrication. Since the deposition is from the organometallic platinum precursor, the conductive lines directly written by focused ion-beam (FIB) and focused electron-beam (FEB) are carbon-rich materials. We discuss an alternative approach to enhancing the platinum content and improving the conductivity of the conductive leads produced by FIBID and FEBID, namely an annealing treatment. Annealing in pure oxygen at 500 ℃ for 30 min enhances the platinum content values from ～ 18% to 30% and ～ 50% to 90% of FIBID and FEBID, respectively. Moreover, we find that thin films will be formed in the FIBID and FEBID processes. The annealing treatment is helpful to avoid the current leakage caused by these thin films. A single electron transistor is fabricated by FEBID and the current-voltage curve shows the Coulomb blockade effect.

Keywords: electron-beam-induced deposition ion-beam-induced deposition annealing current leakage single electron transistor

Received: 14 December 2013
Revised: 10 March 2014
Accepted manuscript online:

PACS:	81.15.Jj	(Ion and electron beam-assisted deposition; ion plating)
	68.35.Dv	(Composition, segregation; defects and impurities)
	81.40.Ef	(Cold working, work hardening; annealing, post-deformation annealing, quenching, tempering recovery, and crystallization)

Fund: Project supported by the Research Project of National University of Defense Technology, China (Grant No. JC13-02-14) and the National Natural Science Foundation of China (Grant No. 11104349).

Corresponding Authors: Fang Jing-Yue
E-mail: fjy_nudt@yahoo.com.cn

Cite this article:

Fang Jing-Yue (方靖岳), Qin Shi-Qiao (秦石乔), Zhang Xue-Ao (张学骜), Liu Dong-Qing (刘东青), Chang Sheng-Li (常胜利) Annealing effect of platinum-incorporated nanowires created by focused ion/electron-beam-induced deposition 2014 Chin. Phys. B 23 088111

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Annealing effect of platinum-incorporated nanowires created by focused ion/electron-beam-induced deposition

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