| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
Prev
Next
|
|
|
Atmospheric pressure plasma jet utilizing Ar and Ar/H2O mixtures and its applications to bacteria inactivation |
| Cheng Cheng (程诚)a b, Shen Jie (沈洁)a, Xiao De-Zhi (肖德志)a, Xie Hong-Bing (谢洪兵)a, Lan Yan (兰彦)a, Fang Shi-Dong (方世东)a, Meng Yue-Dong (孟月东)a, Chu Paul K (朱剑豪)b |
a Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China;
b Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, China |
|
|
|
|
Abstract An atmospheric pressure plasma jet generated with Ar with H2O vapor is characterized and applied to inactivation of Bacillus subtilis spores. The emission spectra obtained from Ar/H2O plasma shows a higher intensity of OH radicals compared to pure argon at a specified H2O concentration. The gas temperature is estimated by comparing the simulated spectra of the OH band with experimental spectra. The excitation electron temperature is determined from the Boltzmann's plots and Stark broadening of the hydrogen Balmer Hβ line is applied to measure the electron density. The gas temperature, excitation electron temperature, and electron density of the plasma jet decrease with the increase of water vapor concentration at a fixed input voltage. The bacteria inactivation rate increases with the increase of OH generation reaching a maximum reduction at 2.6% (v/v) water vapor. Our results also show that the OH radicals generated by the Ar/H2O plasma jet only makes a limited contribution to spore inactivation and the shape change of the spores before and after plasma irradiation is discussed.
|
Received: 10 September 2013
Revised: 07 January 2014
Accepted manuscript online:
|
|
PACS:
|
52.50.Dg
|
(Plasma sources)
|
| |
94.20.Fg
|
(Plasma temperature and density)
|
| |
52.77.-j
|
(Plasma applications)
|
|
| Fund: Project supported by the National Natural Science Foundation of China (Grant No. 11005126), the Hefei Institute of Physical Science, Chinese Academy of Sciences Dean Fund, China (Grant No. YZJJ201331), and the City University of Hong Kong Applied Research Grant, China (Grant Nos. 9667066 and 9667069). |
Corresponding Authors:
Cheng Cheng, Chu Paul K
E-mail: chengcheng@ipp.ac.cn;paul.chu@cityu.edu.hk
|
| About author: 52.50.Dg; 94.20.Fg; 52.77.-j |
Cite this article:
Cheng Cheng (程诚), Shen Jie (沈洁), Xiao De-Zhi (肖德志), Xie Hong-Bing (谢洪兵), Lan Yan (兰彦), Fang Shi-Dong (方世东), Meng Yue-Dong (孟月东), Chu Paul K (朱剑豪) Atmospheric pressure plasma jet utilizing Ar and Ar/H2O mixtures and its applications to bacteria inactivation 2014 Chin. Phys. B 23 075204
|
| [1] |
Cheng C, Zhang L Y and Zhan R 2006 Surf. Coat. Technol. 200 6659
|
| [2] |
Walsh J L and Kong M G 2008 Appl. Phys. Lett. 93 111501
|
| [3] |
Schäfer J, Foest R, Quade A, Ohl A and Weltmann K D 2008 J. Phys. D: Appl. Phys. 41 194010
|
| [4] |
Weltmann K, Kindel E, Brandenburg R, Meyer C, Bussiahn R, Wilke C and Woedtke T 2009 Contrib. Plasma Phys. 49 631
|
| [5] |
Huang C, Yu Q, Hsieh F and Duan Y 2007 Plasma Proces. Polym. 4 77
|
| [6] |
Cheng C, Liu P, Xu L, Zhang LY, Zhan R J and Zhang W R 2006 Chin. Phys. 15 1544
|
| [7] |
Uhm H S, Lim J P and Li S Z 2007 Appl. Phys. Lett. 90 261501
|
| [8] |
Lim J P, Uhm H S and Li S Z 2007 Phys. Plasmas 14 093504
|
| [9] |
Arnoult G, Cardoso R P, Belmonte T and Henrion G 2008 Appl. Phys. Lett. 93 191507.
|
| [10] |
Shashurin A, Keidar M, Bronnikov S, Jurjus R A and Stepp M A 2008 Appl. Phys. Lett. 93 181501
|
| [11] |
Qian M, Ren C, Wang D, Zhang J and Wei G 2010 J. Appl. Phys. 107 063303
|
| [12] |
Ayan H, Yildirim E D, Pappas D D and Sun W 2011 Appl. Phys. Lett. 99 111502
|
| [13] |
Cao Z, Walsh J L and Kong M G 2009 Appl. Phys. Lett. 94 021501
|
| [14] |
Li Q, Li J, Zhu W, Zhu X and Pu Y 2009 Appl. Phys. Lett. 95 141502
|
| [15] |
Sarani A, Nikiforov A Y and Leys C 2010 Phys. Plasmas 17 063504
|
| [16] |
Nikiforov A Y, Sarani A and Leys C 2011 Plasma Sources Sci. Technol. 20 015014
|
| [17] |
Kang S K, Choi M Y, Koo I G, Kim P Y, Kim Y, Kim G J, Mohamed A H, Collins G J and Lee J K 2011 Appl. Phys. Lett. 98 143702
|
| [18] |
Deng S Xi, Cheng C, Ni G H, Meng Y D and Chen H 2010 Chin. Phys. B 19 105203
|
| [19] |
Deng S X, Cheng C, Ni G H, Meng Y D and Chen H 2010 Curr. Appl. Phys. 10 1164
|
| [20] |
Srivastava N and Wang C 2011 IEEE Trans. Plasma Sci. 39 918
|
| [21] |
Srivastava N and Wang C 2011 J. Appl. Phys. 110 053304
|
| [22] |
Wang C and Srivastava N 2010 Eur. Phys. J. D 60 465
|
| [23] |
Kim K, Choi J D, Hong Y C, Kim G, Noh E J, Lee J and Yang S S 2011 Appl. Phys. Lett. 98 073701
|
| [24] |
Kim S J, Chung T H, Bae S H and Leem S H 2009 Appl. Phys. Lett. 94 141502
|
| [25] |
Xiong Z, Lu X, Xian Y, Jiang Z and Pan Y 2010 J. Appl. Phys. 108 103303
|
| [26] |
O'Connora N and Daniels S J 2011 Appl. Phys. 110 013308
|
| [27] |
Walsh J L and Kong M G 2011 Appl. Phys. Lett. 99 081501
|
| [28] |
Liu J J and Kong M G 2011 J. Phys. D: Appl. Phys. 44 345203
|
| [29] |
Sun P, Sun Y, Wu H, Zhu W, Lopez J L, Liu W, Zhang J, Li R and Fang J 2011 Appl. Phys. Lett. 98 021501
|
| [30] |
Kolb J F, Mohamed A H, Price R O, Swanson R J, Bowman A, Chiavarini R L, Stacey M and Schoenbach K H 2008 Appl. Phys. Lett. 92 241501
|
| [31] |
Xiong Q, Lu X P, Ostrikov K, Xian Y, Zou C, Xiong Z and Pan Y 2010 Phys. Plasmas 17 043506
|
| [32] |
Laroussi M 2009 IEEE Trans. Plasma Sci. 37 714
|
| [33] |
Nagatsu M, Terashita F, Nonaka H, Xu L, Nagata T and Koide Y 2005 Appl. Phys. Lett. 86 211502
|
| [34] |
Zhao Y, Ogino A and Nagatsua M 2011 Appl. Phys. Lett. 98 191501
|
| [35] |
Perni S, Shama G, Hobman J L, Lund P A, Kershaw C J, Hidalgo-Arroyo G A, Penn C W, Deng X T, Walsh J L and Kong M G 2007 Appl. Phys. Lett. 90 073902
|
| [36] |
Shen J, Cheng C, Fang S, Xie H, Lan Y, Ni G, Meng Y, Luo J and Wang X 2012 Appl. Phys. Express 5 036201
|
| [37] |
Zhu X M, Chen W C and Pu Y K 2008 J. Phys. D: Appl. Phys. 41 105212
|
| [38] |
Bruggeman P, Verreycken T, Gonzalez M, Walsh J L, Kong M G, Leys C and Schram D C 2010 J. Phys. D: Appl. Phys. 43 124005
|
| [39] |
Zhang J, Bian X, Chen Q, Liu F and Liu Z 2009 Chin. Phys. Lett. 26 035203
|
| [40] |
Sáinz A and García M C 2008 Spectrochim. Acta Part B 63 948
|
| [41] |
Torres J, Jonkers J, van de Sanden M J, van der Mullen J J A M, Gamero A and Sola A 2003 J. Phys. D: Appl. Phys. 36 L55
|
| [42] |
Balcon N, Aanesland A and Boswell R 2007 Plasma Sources Sci. Technol. 16 217
|
| [43] |
Torres J, van de Sande M J, van der Mullen J J A M, Gamero A and Sola A 2006 Spectrochim. Acta Part B 61 58
|
| [44] |
Torres J, Palomares J M, Sola A, van der Mullen J J A M and Gamero A 2007 J. Phys. D: Appl. Phys. 40 5929
|
| [45] |
Konjevic R and Konjevic N 1997 Spectrochim. Acta Part B 52 2077
|
| No Suggested Reading articles found! |
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
Cited |
|
|
|
|
Altmetric
|
|
blogs
Facebook pages
Wikipedia page
Google+ users
|
Online attention
Altmetric calculates a score based on the online attention an article receives. Each coloured thread in the circle represents a different type of online attention. The number in the centre is the Altmetric score. Social media and mainstream news media are the main sources that calculate the score. Reference managers such as Mendeley are also tracked but do not contribute to the score. Older articles often score higher because they have had more time to get noticed. To account for this, Altmetric has included the context data for other articles of a similar age.
View more on Altmetrics
|
|
|
