Chin. Phys. B
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Chin. Phys. B  2014, Vol. 23 Issue (6): 065201    DOI: 10.1088/1674-1056/23/6/065201
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Current Issue| Next Issue| Archive| Adv Search |
Characteristics of dual-frequency capacitively coupled SF6/O2 plasma and plasma texturing of multi-crystalline silicon
Xu Dong-Shenga, Zou Shuaia b, Xin Yua, Su Xiao-Donga, Wang Xu-Shengb
a Provincial Key Laboratory of Thin Films, School of Physical Science and Technology, Soochow University, Suzhou 215006, China;
b Canadian Solar Inc. China, Suzhou 215000, China

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