Chin. Phys. B
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Chin. Phys. B  2013, Vol. 22 Issue (10): 105101    DOI: 10.1088/1674-1056/22/10/105101
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES Current Issue| Next Issue| Archive| Adv Search |
The mechanism of hydrogen plasma passivation for poly-crystalline silicon thin film
Li Juana, Luo Chonga, Meng Zhi-Guoa, Xiong Shao-Zhena, Hoi Sing Kwokb
a Institute of Photo-Electronics, Tianjin Key Laboratory for Photo-Electronic Thin Film Devices and Technology, Nankai University, Tianjin 300071, China;
b Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong, China

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