Comparative investigation of resistance and ability to trigger high voltage discharge for single and multiple femtosecond filaments in air

doi:10.1088/1674-1056/22/3/035203

Abstract A comparative investigation of resistance and ability to trigger high voltage (HV) discharge for single filament (SF) and multiple filaments (MF) has been carried out. The experimental results show that the trend of the breakdown threshold of the SF exactly follows that of its resistance, but this is not the case for the MF. The MF's resistance is much smaller than SF's. However, the MF shows a bit higher HV breakdown threshold than the SF. The underlying physics is that the measured resistance of the MF is collectively contributed by every filament in the MF while the HV breakdown threshold is determined by only one single discharging path.

Keywords: femtosecond filament resistance high voltage breakdown threshold

Received: 26 May 2012
Revised: 05 November 2012
Accepted manuscript online:

PACS:

52.38.Hb

(Self-focussing, channeling, and filamentation in plasmas)

Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11074027, 60978014, 61178022, 11274053, and 11211120156), the Funds from Sci. & Tech. Deparment of Jilin Province, China (Grant No. 20111812).

Corresponding Authors: Lin Jing-Quan
E-mail: linjingquan@cust.edu.cn

Cite this article:

Guo Kai-Min (郭凯敏), Hao Zuo-Qiang (郝作强), Lin Jing-Quan (林景全), Sun Chang-Kai (孙长凯), Gao Xun (高勋), Zhao Zhen-Ming (赵振明) Comparative investigation of resistance and ability to trigger high voltage discharge for single and multiple femtosecond filaments in air 2013 Chin. Phys. B 22 035203

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Comparative investigation of resistance and ability to trigger high voltage discharge for single and multiple femtosecond filaments in air

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