Optimized growth and dielectric properties of barium titanate thin films on polycrystalline Ni foils

doi:10.1088/1674-1056/21/6/067701

Abstract Barium titanate (BTO) thin films were deposited on polycrystalline Ni foils by using the polymer assisted deposition (PAD) technique. The growth conditions including ambient and annealing temperatures were carefully optimized based on thermal dynamic analysis to control the oxidation processing and interdiffusion. Crystal structures, surface morphologies, and dielectric performance were examined and compared for BTO thin films annealed under different temperatures. Correlations between the fabrication conditions, microstructures, and dielectric properties were discussed. BTO thin films fabricated under the optimized conditions show good crystalline structure and promising dielectric properties with ε_r ～ 400 and tanδ <0.025 at 100 kHz. The data demonstrate that BTO films grown on polycrystalline Ni substrates by PAD are promising in device applications.

Keywords: polymer assisted deposition barium titanate nickel foils thin films thermodynamics dielectric properties

Received: 22 February 2012
Revised: 28 February 2012
Accepted manuscript online:

PACS:	77.84.-s	(Dielectric, piezoelectric, ferroelectric, and antiferroelectric materials)
	77.55.fe	(BaTiO3-based films)
	77.55.Nv	(Multiferroic/magnetoelectric films)

Fund: Project supported by the National Natural Science Foundation of China (Grant Nos. 11028409 and 60976061) and the Fundamental Research Funds for the Central Universities of China (Grant No. ZYGX2009Z0001).

Corresponding Authors: Lin Yuan
E-mail: linyuan@uestc.edu.cn

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Liang Wei-Zheng(梁伟正), Ji Yan-Da(吉彦达), Nan Tian-Xiang(南天翔), Huang Jiang(黄江), Zeng Hui-Zhong(曾慧中), Du Hui(杜辉), Chen Chong-Lin(陈充林), and Lin Yuan(林媛) Optimized growth and dielectric properties of barium titanate thin films on polycrystalline Ni foils 2012 Chin. Phys. B 21 067701

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Optimized growth and dielectric properties of barium titanate thin films on polycrystalline Ni foils

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