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Chin. Phys. B, 2011, Vol. 20(2): 026103    DOI: 10.1088/1674-1056/20/2/026103
CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES Prev   Next  

Effects of the sputtering power on the crystalline structure and optical properties of the silver oxide films deposited using direct-current reactive magnetron sputtering

Gao Xiao-Yong(郜小勇), Zhang Zeng-Yuan(张增院), Ma Jiao-Min(马姣民), Lu Jing-Xiao(卢景霄), Gu Jin-Hua(谷锦华), and Yang Shi-E(杨仕娥)
The Key Lab of Materials Physics of Ministry of Education, School of Physics and Engineering, Zhengzhou University, Zhengzhou 450052, China
Abstract  This paper reports that a series of silver oxide (AgxO) films are deposited on glass substrates by direct-current reactive magnetron sputtering at a substrate temperature of 250 ℃ and an oxygen flux ratio of 15:18 by modifying the sputtering power (SP). The AgxO films deposited apparently show a structural evolution from cubic biphased (AgO + Ag2O) to cubic single-phased (Ag2O), and to biphased (Ag2O + AgO) structure. Notably, the cubic single-phased Ag2O film is deposited at the SP = 105 W and an AgO phase withorientation discerned in the AgxO films deposited using the SP > 105 W. The transmissivity and reflectivity of the AgxO films in transparent region decrease with the increase the SP, whereas the absorptivity inversely increases with the increase of the SP. These results may be due to the structural evolution and the increasing film thickness. A redshift of the films' absorption edges determined in terms of Tauc formula clearly occurs from 3.1 eV to 2.73 eV with the increase of the SP.
Keywords:  AgxO film      direct-current reactive magnetron sputtering      x-ray diffraction      optical properties  
Received:  17 August 2010      Revised:  02 September 2010      Accepted manuscript online: 
PACS:  61.82.Fk (Semiconductors)  
  61.05.cp (X-ray diffraction)  
  74.25.Gz (Optical properties)  
  81.15.Cd (Deposition by sputtering)  
Fund: Project supported by the National Natural Science Foundation of China (Grant No. 60807001), the National Basic Research Program of China (Grant No. 2011CB201605), and the Foundation of Henan Educational Committee (Grant No. 2010A140017).

Cite this article: 

Gao Xiao-Yong(郜小勇), Zhang Zeng-Yuan(张增院), Ma Jiao-Min(马姣民), Lu Jing-Xiao(卢景霄), Gu Jin-Hua(谷锦华), and Yang Shi-E(杨仕娥) Effects of the sputtering power on the crystalline structure and optical properties of the silver oxide films deposited using direct-current reactive magnetron sputtering 2011 Chin. Phys. B 20 026103

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