Synthesis of ZnO films with a special texture and enhanced field emission properties

doi:10.1088/1674-1056/20/10/105203

Abstract ZnO films with special textures are fabricated on Mo-coated Al₂O₃ ceramic substrates by the catalyst-free electron beam evaporation method, and the as-deposited films are treated by hydrogen plasma. It is found that the surface morphologies of the films are changed significantly after hydrogen plasma treatment and that the films consist of vertically standing and intersecting nanosheets. A lower turn-on field of 1.2 V/μm and an enhanced current density ～0.11 mA/cm² at 2.47 V/μm are achieved. The low threshold field and the high emission current density are attributed primarily to the unique shape and smaller resistivity of the ZnO nanosheet films.

Keywords: nano-ZnO thin films hydrogen plasma treatment field electron emission microwave plasma chemical vapour deposition

Received: 18 April 2011
Revised: 30 May 2011
Accepted manuscript online:

PACS:	52.77.-j	(Plasma applications)
	79.60.Jv	(Interfaces; heterostructures; nanostructures)
	79.70.+q	(Field emission, ionization, evaporation, and desorption)

Fund: Project supported by the Science Foundation of Shanghai Human Resources and Social Security Bureau, China (Grant No. 2009023).

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Wang Xiao-Ping(王小平), Wang Zi(王子), Wang Li-Jun(王丽军), and Mei Cui-Yu(梅翠玉) Synthesis of ZnO films with a special texture and enhanced field emission properties 2011 Chin. Phys. B 20 105203

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