Key Laboratory of Nano-Fabrication and Novel Device Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
Abstract A novel diffractive optical element, named phase zone photon sieve (PZPS), is presented. There are three kinds of phase plates in PZPSs: PZPS1, PZPS2, and PZPS3. Each of the PZPSs has its own structure and is made on quartz substrate by etching. The three PZPSs have stronger diffraction peak intensity than a photon sieve (PS) when the margin pinhole and zone line width are kept the same. The PZPS3 can produce a smaller central diffractive spot than the ordinary PS with the same number of zones on the Fresnel zone plate. We have given the design method for and the simulation of PZPS and PS. PZPS has potential applications in optical maskless lithography.
Received: 18 April 2008
Revised: 15 August 2008
Accepted manuscript online:
Fund: Project supported by the National
Key Basic Research Special Foundation of China (Grant No
2007CB935302) and the National Natural Science
Foundation of China (Grant No 60825403).
Cite this article:
Jia Jia(贾佳) and Xie Chang-Qing(谢常青) Phase zone photon sieve 2009 Chin. Phys. B 18 183
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