Chin. Phys. B
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Chin. Phys. B  2008, Vol. 17 Issue (9): 3448-3452    DOI: 10.1088/1674-1056/17/9/051
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Current Issue| Next Issue| Archive| Adv Search |
Influence of reaction gas flows on the properties of SiGe:H thin film prepared by plasma assisted reactive thermal chemical vapour deposition
Zhang Li-Ping, Zhang Jian-Jun, Shang Ze-Ren, Hu Zeng-Xin, Geng Xin-Hua, Zhao Ying
Institute of Photo-Electronics Thin Film Devices and Technique, Nankai University, Tianjin Key Laboratory of Photo-Electronic Thin Film Devices and TechnologyLaboratory of Opto-electronic Information Science and Technology(Nankai University, Tianjin Unive

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