Chin. Phys. B
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Chin. Phys. B  2008, Vol. 17 Issue (4): 1394-1399    DOI: 10.1088/1674-1056/17/4/040
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Current Issue| Next Issue| Archive| Adv Search |
Effects of deposition pressure and plasma power on the growth and properties of boron-doped microcrystalline silicon films
Wang Jian-Huaa, Yang Shi-Eb, Lu Jing-Xiaob, Gao Xiao-Yongb, Gu Jin-Huab, Zheng Wenb, Zhao Shang-Lib, Chen Yong-Shengc
a Depart of Materials Science and Engineering, Wuhan Institute of Technology, Wuhan 430073, China; b Key Laboratory of Material Physics, Department of Physics, Zhengzhou University, Zhengzhou 450052, China; c Key Laboratory of Material Physics, Department of Physics, Zhengzhou University, Zhengzhou 450052, China;Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China

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