Photodetachment cross section of S- in electric and magnetic fields
Wang De-Hua(王德华)a)† and Ding Shi-Liang(丁世良)b)
a College of Physics and Electronic Engineering, Ludong University, Yantai 264025, China; b School of Physics and Microelectronics, Shandong University, Jinan 250100, China
Abstract In this paper, the quantum-mechanical photodetachment cross section of S- in uniform electric and magnetic fields at arbitrary angles is presented. It compares the quantum-mechanical cross section with the quantum source formalism cross section. The results show that at large angle, the two results have good agreements, however, with the decrease of the angles, they deviate obviously from each other. The reasons for this discrepancy are also discussed.
Received: 25 November 2005
Revised: 13 July 2006
Accepted manuscript online:
PACS:
32.80.Gc
(Photodetachment of atomic negative ions)
Fund: Project supported by the National Natural Science Foundation of China (Grant No 10604045) and the Doctoral Scientific Research Startup Foundation of Ludong University (Grant No 202-23000301).
Cite this article:
Wang De-Hua(王德华) and Ding Shi-Liang(丁世良) Photodetachment cross section of S- in electric and magnetic fields 2007 Chinese Physics 16 671
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