Chin. Phys. B
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Chin. Phys.  2007, Vol. 16 Issue (2): 524-528    DOI: 10.1088/1009-1963/16/2/039
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES Current Issue| Next Issue| Archive| Adv Search |
Improvement of electrical properties of Cu/SiCOH low-k film integrated system by O2 plasma treatment
Liang Rong-Qinga, Qian Xiao-Meib, Wei Yong-Xiab, Yu Xiao-Zhub, Ye Chaob, Ning Zhao-Yuanb
a Institute of Modern Physics, Fudan University, Shanghai 200433, China; b School of Physics Science and Technology, Key Laboratory of Thin Films, Soochow University, Suzhou 215006, China

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