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Chinese Physics, 2006, Vol. 15(8): 1888-1891    DOI: 10.1088/1009-1963/15/8/043
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Deposition of carbon nitride films for space application

Feng Yu-Dong(冯煜东)a),b), Xu Chao(胥超)a), Wang Yi(王艺)b), and Zhang Fu-Jia(张福甲)a)†
a Physics Department, Lanzhou University, Lanzhou 730000, China; b Lanzhou Institute of Physics, Lanzhou 730000, China
Abstract  Carbon nitride thin films were prepared by electron-beam evaporation assisted with nitrogen ion bombardment and TiN/CNx composite films were by unbalanced dc magnetron sputtering, respectively. It was found that the sputtered films were better than the evaporated films in hardness and adhesion. The experiments of atomic oxygen action, cold welding, friction and wearing were emphasized, and the results proved that the sputtered TiN/CNx composite films were suitable for space application.
Keywords:  CNx film      hardness      atomic oxygen      cold welding      friction      wear  
Received:  15 October 2005      Revised:  25 April 2006      Accepted manuscript online: 
PACS:  81.15.Ef  
  81.15.Cd (Deposition by sputtering)  
  68.60.Bs (Mechanical and acoustical properties)  
  68.35.Np (Adhesion)  

Cite this article: 

Feng Yu-Dong(冯煜东), Xu Chao(胥超), Wang Yi(王艺), and Zhang Fu-Jia(张福甲) Deposition of carbon nitride films for space application 2006 Chinese Physics 15 1888

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