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Chinese Physics, 2005, Vol. 14(7): 1428-1432    DOI: 10.1088/1009-1963/14/7/028
CONDENSED MATTER: STRUCTURAL, MECHANICAL, AND THERMAL PROPERTIES Prev   Next  

Pyrosol process for deposition of fluorine-doped tin dioxide thin films

Qu Yi (曲艺)a, Zhang Xin (张馨)a, Chen Hong (陈红)a, Gao Jin-Yue (高锦岳)a, Zhou Da-Fan (周大凡)b
a College of Physics, Jilin University, Changchun 130023, China; b Institue of Changchun New-Century Nanotechnology , Changchun 130033, China
Abstract  Transparent low-resistance SnO$_{2}$:F films, suitable as a low-emissivity and conducting coating, have been deposited on silica-coated soda lime glass substrates by pyrosol process. SnCl$_{4}\cdot $5H$_{2}$O and NH$_{4}$F dissolved in solvent of 50% C$_{2}$H$_{5}$OH/50% H$_{2}$O served as the starting solution. With the parameters such as substrate temperature of 450${^\circ}$C, distance between the nozzle and substrate of 60mm, carrier gas flow rate of 8L/min and deposition time of 5min, the optimized SnO$_{2}$:F films having a sheet resistance of about 2$\Omega$/$\Box$, were deposited repeatedly. The relationship between sheet resistances and infrared transmission spectra of SnO$_{2}$:F films is shown schematically.
Keywords:  pyrosol deposition      tin dioxide      conducting coating  
Received:  15 September 2004      Revised:  21 March 2005      Accepted manuscript online: 
PACS:  73.61.Ng (Insulators)  
  68.55.A- (Nucleation and growth)  
  73.50.Gr (Charge carriers: generation, recombination, lifetime, trapping, mean free paths)  
  78.30.Hv (Other nonmetallic inorganics)  
  68.55.Ln (Defects and impurities: doping, implantation, distribution, concentration, etc.)  

Cite this article: 

Qu Yi (曲艺), Zhang Xin (张馨), Chen Hong (陈红), Gao Jin-Yue (高锦岳), Zhou Da-Fan (周大凡) Pyrosol process for deposition of fluorine-doped tin dioxide thin films 2005 Chinese Physics 14 1428

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