Grain size and its distribution in NiTi thin films sputter-deposited on heated substrates
Li Yong-Hua (李永华)ab, Meng Fan-Ling (孟繁玲)a, Qiu Deng-Li (仇登利)c, Wang Yi (王一)a, Zheng Wei-Tao (郑伟涛)a, Wang Yu-Ming (王煜明)a
a Department of Materials Science, College of Material Science and Engineering, Jilin University, Changchun 130023, China; b Division of Basic Courses, Northeastern University at Qinghuangdao, Qinghuangdao 066004, China; c Key Laboratory for Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130023, China
Abstract Grain size and its distribution in NiTi thin films sputter-deposited on a heated substrate have been investigated using the small angle x-ray scattering technique. The crystalline particles have a small size and are distributed over a small range of sizes for the films grown at substrate temperatures 370 and 420℃. The results show that the sizes of crystalline particles are about the same. From the x-ray diffraction profiles, the sizes of crystalline particles obtained were 2.40nm and 2.81nm at substrate temperatures of 350 and 420℃, respectively. The morphology of NiTi thin films deposited at different substrate temperatures has been studied by atomic force microscopy. The root mean square roughness calculated for the film deposited at ambient temperature and 420℃ are 1.42 and 2.75nm, respectively.
Received: 03 November 2003
Revised: 23 April 2004
Accepted manuscript online:
Fund: Project supported by the Science and Technology Committee of Jilin Province, China (Grant No 20020611) and the National Natural Science Foundation of China (Grant No 50372024).
Cite this article:
Li Yong-Hua (李永华), Meng Fan-Ling (孟繁玲), Qiu Deng-Li (仇登利), Wang Yi (王一), Zheng Wei-Tao (郑伟涛), Wang Yu-Ming (王煜明) Grain size and its distribution in NiTi thin films sputter-deposited on heated substrates 2004 Chinese Physics 13 1315
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